Ultra-low-k materials based on nanoporous fluorinated polyimide with well-defined pores via the RAFT-moderated graft polymerization process
نویسندگان
چکیده
Y. W. Chen, W. C. Wang, W. H. Yu, E. T. Kang,* K. G. Neoh, R. H. Vora, C. K. Ong and L. F. Chen Department of Chemical Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260. E-mail: [email protected]; Fax: (65) 67791936; Tel: (65) 68742189 Department of Materials Science, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260 Department of Physics, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260
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